This tender with title ОКР "Разработка и производство промышленно-ориентированного технологического комплекса плазмохимического осаждения (ПХО) на базе кластерной системы с технологическими модулями: - модуль PECVD осаждения нитрида кремния; - модуль PECVD осаждения оксида кремния (SiH4/N2O); - модуль PECVD осаждения оксида кремния (TEOS); - модуль субатмосферного осаждения оксида кремния из TEOS/03 и роботизированной системы транспортирования пластин с использованием FOUP контейнеров", шифр "Кластер ПХО 65" -- ROC "Development and production of an industrial-oriented technological complex for plasma chemical deposition (PCD) based on a cluster system with technological modules: - PECVD module for silicon nitride deposition; - PECVD module for silicon oxide deposition (SiH4 / N2O); - PECVD module for silicon oxide deposition (TEOS) ); - module for subatmospheric deposition of silicon oxide from TEOS / 03 and a robotic system for transporting wafers using FOUP containers ", code" Cluster PHO 65 " has been published on Bidding Source portal dated 29 Sep 2021 for the country of Russia. It has been categorized on Chemical products & Various chemical products & Chemical elements, inorganic acids and compounds & Nitrides & Zinc oxide and peroxide, titanium oxide, dyes and pigments & Lead oxide & Copper oxide & Oxides, peroxides and hydroxides & Tanks, reservoirs, containers and pressure vessels & Manganese oxide & Magnesium oxide & Large containers & Zinc oxide & Titanium oxide & Chromium, manganese, magnesium, lead and copper oxides and hydroxides & Chromium oxide. For similar tenders you can see tenders mentioned below of this page.
ROC "Development and production of an industrial-oriented technological complex for plasma chemical deposition (PCD) based on a cluster system with technological modules: - PECVD module for silicon nitride deposition; - PECVD module for silicon oxide deposition (SiH4 / N2O); - PECVD module for silicon oxide deposition (TEOS) ); - module for subatmospheric deposition of silicon oxide from TEOS / 03 and a robotic system for transporting wafers using FOUP containers ", code" Cluster PHO 65 "
General Information
ROC "Development and production of an industrial-oriented technological complex for plasma chemical deposition (PCD) based on a cluster system with technological modules: - PECVD module for silicon nitride deposition; - PECVD module for silicon oxide deposition (SiH4 / N2O); - PECVD module for silicon oxide deposition (TEOS) ); - module for subatmospheric deposition of silicon oxide from TEOS / 03 and a robotic system for transporting wafers using FOUP containers ", code" Cluster PHO 65 "
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